Electron Beam Lithography
Electron Beam Lithography
Electron Beam Lithography

Range of application

The JEOL product range includes systems for mask and direct-write lithography, from laboratory systems to production systems for mask technology.

For less complex lithography applications, particularly in the field of research and development and in nanotechnology, JEOL also supplies modular systems based on scanning electron microscopes.

Solutions

  • Point beam systems for extremely fine structures
  • Smallest tolerances
  • Can be switched between manual, single-sample mode and automatic loading systems
  • Various sizes of write fields
  • Gaussian or variable-shape beam

Detailed solutions

No entries available

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